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Comparative investigations of the secondary ion emission of metal complexes under MeV and keV ion bombardment
Author(s) -
Feld Herbert,
Rading Derk,
Leute Angelika,
Benninghoven Alfred
Publication year - 1993
Publication title -
organic mass spectrometry
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.475
H-Index - 121
eISSN - 1096-9888
pISSN - 0030-493X
DOI - 10.1002/oms.1210280805
Subject(s) - fragmentation (computing) , ion , secondary ion mass spectrometry , chemistry , static secondary ion mass spectrometry , ionic bonding , analytical chemistry (journal) , mass spectrometry , polyatomic ion , mass spectrum , yield (engineering) , desorption , metal , materials science , adsorption , chromatography , metallurgy , operating system , organic chemistry , computer science
A series of ionic and neutral Group VIII transition metal complexes with molecular masses up to 2500 u were analysed by time‐of‐flight secondary ion mass spectrometry (SIMS) and plasma desorption mass spectrometry (PDMS). The secondary ion emission, the secondary ion yields and the yield ratios Y (PDMS)/ Y (SIMS) of 20 ionic and neutral metal complexes were determined. Both techniques generally provide both molecular and fragment ion information. Characteristic fragmentation patterns give useful data for structural characterization. Additionally, the stabilities of different secondary ion species were compared by their half‐lives. Both PDMS and SIMS are very sensitive, yielding optimum spectra from total sample sizes as low as 5 nmol, and the sample consumption is negligible.