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Ionization by fast atom bombardment—A chemical lonization (matrix) process in the gas phase? 1
Author(s) -
Schröder E.,
Münster H.,
Budzikiewicz H.
Publication year - 1986
Publication title -
organic mass spectrometry
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.475
H-Index - 121
eISSN - 1096-9888
pISSN - 0030-493X
DOI - 10.1002/oms.1210211016
Subject(s) - fast atom bombardment , ionization , plasma , ion , atom (system on chip) , matrix (chemical analysis) , ionic bonding , phase (matter) , gas phase , atomic physics , chemistry , analytical chemistry (journal) , materials science , physics , chromatography , organic chemistry , nuclear physics , computer science , embedded system
It is proposed that ion formation from non‐ionic substrates under fast atom bombardment occurs essentially by chemical ionization in the gas phase by a matrix plasma. Corroborating experiments regarding the matrix plasma are presented.