ESR studies of nitroxide radicals formed in the low temperature photolysis of  N ‐nitrosamines | Zendy

Joshi Avinash | Zendy; Yang George C. | Zendy

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ESR studies of nitroxide radicals formed in the low temperature photolysis of N ‐nitrosamines

Author(s) -

Joshi Avinash,

Yang George C.

Publication year - 1981

Publication title -

organic magnetic resonance

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.483

H-Index - 72

eISSN - 1097-458X

pISSN - 0030-4921

DOI - 10.1002/mrc.1270170213

Subject(s) - chemistry , nitroxide mediated radical polymerization , radical , photodissociation , toluene , methylene , photochemistry , atmospheric temperature range , hyperfine structure , yield (engineering) , nitrosamine , medicinal chemistry , organic chemistry , carcinogen , polymer , radical polymerization , materials science , polymerization , physics , quantum mechanics , meteorology , metallurgy

Various N ‐nitrosamines were photolyzed in toluene solution in the temperature range −100°C to −30°C to yield dialkyl nitroxides. The nitrosamines studied were N ‐nitrosodimethylamine, N ‐nitrosodiethylamine, N ‐nitrosodipropylamine, N ‐nitrosodibutylamine and N ‐nitrosodicyclohexylamine. Subsequent nitroxide side products were also detected by ESR, and a mechanism for their formation is proposed. Temperature dependent hyperfine couplings of the methylene protons were observed for a few radicals of the type R 1 CH 2 NO ˙ R 2 .

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