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ESR studies of nitroxide radicals formed in the low temperature photolysis of N ‐nitrosamines
Author(s) -
Joshi Avinash,
Yang George C.
Publication year - 1981
Publication title -
organic magnetic resonance
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.483
H-Index - 72
eISSN - 1097-458X
pISSN - 0030-4921
DOI - 10.1002/mrc.1270170213
Subject(s) - chemistry , nitroxide mediated radical polymerization , radical , photodissociation , toluene , methylene , photochemistry , atmospheric temperature range , hyperfine structure , yield (engineering) , nitrosamine , medicinal chemistry , organic chemistry , carcinogen , polymer , radical polymerization , materials science , polymerization , physics , quantum mechanics , meteorology , metallurgy
Abstract Various N ‐nitrosamines were photolyzed in toluene solution in the temperature range −100°C to −30°C to yield dialkyl nitroxides. The nitrosamines studied were N ‐nitrosodimethylamine, N ‐nitrosodiethylamine, N ‐nitrosodipropylamine, N ‐nitrosodibutylamine and N ‐nitrosodicyclohexylamine. Subsequent nitroxide side products were also detected by ESR, and a mechanism for their formation is proposed. Temperature dependent hyperfine couplings of the methylene protons were observed for a few radicals of the type R 1 CH 2 NO ˙ R 2 .