Fabrication of low‐loss 45° integrated mirrors on dielectric optical waveguides | Zendy

Joannes L. | Zendy; Grimbert B. | Zendy; Vilcot J. P. | Zendy; Tchana W. | Zendy; Decoster D. | Zendy

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Fabrication of low‐loss 45° integrated mirrors on dielectric optical waveguides

Author(s) -

Joannes L.,

Grimbert B.,

Vilcot J. P.,

Tchana W.,

Decoster D.

Publication year - 1995

Publication title -

microwave and optical technology letters

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.304

H-Index - 76

eISSN - 1098-2760

pISSN - 0895-2477

DOI - 10.1002/mop.4650090617

Subject(s) - materials science , dielectric , microelectronics , waveguide , optoelectronics , silicon nitride , polyimide , etching (microfabrication) , fabrication , optics , reactive ion etching , interconnection , transverse mode , reflection (computer programming) , wavelength , silicon , nanotechnology , layer (electronics) , laser , telecommunications , medicine , alternative medicine , physics , pathology , computer science , programming language

High‐density low‐loss dielectric optical interconnection is demonstrated on a monomode optical waveguide compatible with microelectronics technology. Low‐loss self‐aligned integrated mirrors (SAIM) on a dielectric (polyimide‐silicon nitride‐polyimide) optical waveguide have been fabricated. Optimization of the reactive ion etching process has been made in order to obtain vertical, homogeneous etched sidewalls. Using such a process, 45° integrated mirrors present reflection losses of 0.6 dB at a 830‐nm wavelength (quasi‐TE mode).

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