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Fabrication of low‐loss 45° integrated mirrors on dielectric optical waveguides
Author(s) -
Joannes L.,
Grimbert B.,
Vilcot J. P.,
Tchana W.,
Decoster D.
Publication year - 1995
Publication title -
microwave and optical technology letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.304
H-Index - 76
eISSN - 1098-2760
pISSN - 0895-2477
DOI - 10.1002/mop.4650090617
Subject(s) - materials science , dielectric , microelectronics , waveguide , optoelectronics , silicon nitride , polyimide , etching (microfabrication) , fabrication , optics , reactive ion etching , interconnection , transverse mode , reflection (computer programming) , wavelength , silicon , nanotechnology , layer (electronics) , laser , telecommunications , medicine , alternative medicine , physics , pathology , computer science , programming language
High‐density low‐loss dielectric optical interconnection is demonstrated on a monomode optical waveguide compatible with microelectronics technology. Low‐loss self‐aligned integrated mirrors (SAIM) on a dielectric (polyimide‐silicon nitride‐polyimide) optical waveguide have been fabricated. Optimization of the reactive ion etching process has been made in order to obtain vertical, homogeneous etched sidewalls. Using such a process, 45° integrated mirrors present reflection losses of 0.6 dB at a 830‐nm wavelength (quasi‐TE mode).