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Special consideration on the design of a Y‐junction optical waveguide
Author(s) -
Jeng JyhYuan,
Wang WaySeen
Publication year - 1992
Publication title -
microwave and optical technology letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.304
H-Index - 76
eISSN - 1098-2760
pISSN - 0895-2477
DOI - 10.1002/mop.4650051114
Subject(s) - fabrication , photolithography , constraint (computer aided design) , waveguide , process (computing) , materials science , titanium , optoelectronics , optics , engineering physics , engineering , mechanical engineering , computer science , physics , metallurgy , medicine , alternative medicine , pathology , operating system
The characteristic deterioration of a titanium indiffused Y junction due to the photolithographic process constraint is simulated. It is found that with a slight increase in propagation loss, an improved design, which uses a rounded angle instead of a sharp one for the fabrication of the Y junction, can be created. © 1992 John Wiley & Sons, Inc.
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