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Novel MMIC protection technique in plasma etching process for mechanically movable RF mems antenna
Author(s) -
Kim JungMu,
Lee Sanghyo,
Kim Yongsung,
Kim JongMan,
Cheon Changyul,
Kwon Youngwoo,
Kim YongKweon
Publication year - 2008
Publication title -
microwave and optical technology letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.304
H-Index - 76
eISSN - 1098-2760
pISSN - 0895-2477
DOI - 10.1002/mop.23870
Subject(s) - microelectromechanical systems , monolithic microwave integrated circuit , deep reactive ion etching , antenna (radio) , microwave , materials science , etching (microfabrication) , electrical engineering , slot antenna , radiation pattern , optoelectronics , engineering , layer (electronics) , reactive ion etching , telecommunications , nanotechnology , amplifier , cmos
In this article, we proposed the novel monolithic microwave integrated circuit (MMIC) protection technique in plasma etching process for MMIC mounted mechanically movable RF MEMS antenna. We could eliminate the distortion of radiation pattern caused by RF feed line on antenna frame and torsional hinge as using MMIC direct mounting on antenna plate instead of using external RF power source. Silicon‐based mechanically movable RF MEMS antenna was released using DRIE process, which was performed on the backside of silicon substrate after MMIC mounting on RF MEMS antenna plate. An aluminum layer on the front side of RF MEMS antenna plays a role of etch stop layer for DRIE process. We measured the radiation pattern as rotating the moving plate along the vertical‐ and horizontal‐direction hinge mechanically. We could obtain the radiation pattern without gain reduction and distortion of radiation pattern. © 2008 Wiley Periodicals, Inc. Microwave Opt Technol Lett 50: 3089–3093, 2008; Published online in Wiley InterScience (www.interscience.wiley.com). DOI 10.1002/mop.23870