Premium
Negative refraction from balanced quasi‐planar chiral inclusions
Author(s) -
Marqués Ricardo,
Jelinek Lukas,
Mesa Francisco
Publication year - 2007
Publication title -
microwave and optical technology letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.304
H-Index - 76
eISSN - 1098-2760
pISSN - 0895-2477
DOI - 10.1002/mop.22736
Subject(s) - metamaterial , planar , resonator , refractive index , microwave , negative index metamaterials , negative refraction , etching (microfabrication) , optics , refraction , materials science , physics , optoelectronics , nanotechnology , computer science , quantum mechanics , computer graphics (images) , layer (electronics)
This work proposes a quasi‐planar chiral resonator suitable for the design of negative refractive index metamaterials. It is presented as an analytical model to determine the metamaterial polarizabilities, which is also the basis of a further study of the viability of negative refraction in chiral and racemic arrangements of inclusions made up with the proposed quasi‐planar chiral resonator. The present analysis is expected to pave the way for the design and building of feasible negative refractive index metamaterials whose inclusions can be manufactured by means of standard photo‐etching techniques. © 2007 Wiley Periodicals, Inc. Microwave Opt Technol Lett 49: 2606–2609, 2007; Published online in Wiley InterScience (www.interscience.wiley.com) DOI 10.1002/mop.22736