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Optical properties of SIC/SIO 2 composite thin film
Author(s) -
Yi Jian,
He XiaoDong,
Sun Yue,
Li Yao
Publication year - 2007
Publication title -
microwave and optical technology letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.304
H-Index - 76
eISSN - 1098-2760
pISSN - 0895-2477
DOI - 10.1002/mop.22487
Subject(s) - materials science , fourier transform infrared spectroscopy , composite number , thin film , amorphous solid , microwave , silane , emissivity , reflection (computer programming) , chemical vapor deposition , infrared , deposition (geology) , silicon , amorphous silicon , optics , optoelectronics , composite material , nanotechnology , crystalline silicon , chemistry , telecommunications , crystallography , physics , engineering , computer science , paleontology , programming language , sediment , biology
SiC film was deposited by electron beam‐physical vapor deposition on thermal oxidized silicon substrates at 750°C, and SiC/SiO 2 composite thin film was prepared. The obtained composite film was analyzed by Fourier‐transform infrared (FTIR) transmission and reflection spectroscopy, and the film reveals an amorphous structure and a high emissivity.© 2007 Wiley Periodicals, Inc. Microwave Opt Technol Lett 49: 1551–1553, 2007; Published online in Wiley InterScience (www.interscience.wiley.com). DOI 10.1002/mop.22487