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Small area right angle bends fabricated with hybrid conventional and interference lithography
Author(s) -
Zhou Yaling,
Tan Hua,
Klotzkin David J.
Publication year - 2007
Publication title -
microwave and optical technology letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.304
H-Index - 76
eISSN - 1098-2760
pISSN - 0895-2477
DOI - 10.1002/mop.22408
Subject(s) - lithography , interference lithography , materials science , optics , interference (communication) , waveguide , microwave , photonics , optoelectronics , electron beam lithography , photolithography , engineering , nanotechnology , physics , electrical engineering , resist , telecommunications , fabrication , medicine , channel (broadcasting) , alternative medicine , pathology , layer (electronics)
A technique to fabricate high‐resolution, photonic features in selected areas aligned to large features such as waveguides, sources, or detectors without e‐beam lithography is demonstrated. This low‐cost parallel technique can be readily extended to produce resonant cavities and photonic‐crystals integrated into conventional waveguide structures. A right‐angle bend using integrated Bragg reflectors is designed and characterized. © 2007 Wiley Periodicals, Inc. Microwave Opt Technol Lett 49: 1300–1303, 2007; Published online in Wiley InterScience (www.interscience.wiley.com). DOI 10.1002/mop.22408