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Spiral inductors fabricated on multi‐layered Bragg reflector for Si‐based RF IC applications
Author(s) -
Mai Linh,
Song Haeil,
Minh Tuan Le,
Van Su Pham,
Yoon Giwan
Publication year - 2006
Publication title -
microwave and optical technology letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.304
H-Index - 76
eISSN - 1098-2760
pISSN - 0895-2477
DOI - 10.1002/mop.21621
Subject(s) - distributed bragg reflector , inductor , reflector (photography) , materials science , microwave , spiral (railway) , planar , optoelectronics , substrate (aquarium) , optics , bragg's law , electrical engineering , engineering , physics , telecommunications , computer science , voltage , diffraction , mechanical engineering , wavelength , light source , oceanography , computer graphics (images) , geology
In this paper, for the first time, a novel physical structure of planar spiral inductors fabricated on a multilayered Bragg reflector is proposed. The multilayered Bragg reflector (BR) was fabricated on Si substrate. The effects of the multilayered Bragg reflector and inductor patterns on the characteristics of inductors are studied. The results show that the inductors fabricated on the Bragg reflector result in a significant improvement in terms of the S 11 ‐parameter. This approach seems highly feasible and promising for future Si‐based RF IC applications. © 2006 Wiley Periodicals, Inc. Microwave Opt Technol Lett 48: 1296–1298, 2006; Published online in Wiley InterScience (www.interscience.wiley.com). DOI 10.1002/mop.21621