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Influence of post‐treatment conditions on photoreactive effect of Zn:Fe:LiNbO 3 crystals
Author(s) -
Fang ShuangQuan,
Ma Decai,
Wang Biao,
Ling FuRi,
Wang G.
Publication year - 2006
Publication title -
microwave and optical technology letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.304
H-Index - 76
eISSN - 1098-2760
pISSN - 0895-2477
DOI - 10.1002/mop.21542
Subject(s) - photorefractive effect , holography , erasure , diffraction efficiency , wafer , materials science , microwave , reduction (mathematics) , optoelectronics , diffraction , optics , computer science , physics , telecommunications , geometry , mathematics , programming language
Abstract Three kinds of different Zn:Fe:LiNbO 3 wafers are prepared by proper reduction or oxidation post‐treatment processes. The optical‐damage‐resistance abilities and photorefractive properties are studied using the optical compensator technique and two‐wave coupling measurement, respectively. The holographic storage properties, that is, diffraction efficiency, writing time, erasure time, photorefractive sensitivity, and dynamic range, are also measured or calculated. The analyses indicate that the sample disposed by reduction is the most proper media for holographic storage application. © 2006 Wiley Periodicals, Inc. Microwave Opt Technol Lett 48: 986–988, 2006; Published online in Wiley InterScience (www.interscience.wiley.com). DOI 10.1002/mop.21542