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A comprehensive investigation of thermal treatment effects on resonance characteristics in FBAR devices
Author(s) -
Mai Linh,
Song HaeIl,
Tuan Le Minh,
Su Pham Van,
Yoon Giwan
Publication year - 2005
Publication title -
microwave and optical technology letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.304
H-Index - 76
eISSN - 1098-2760
pISSN - 0895-2477
DOI - 10.1002/mop.21199
Subject(s) - resonator , materials science , microwave , return loss , resonance (particle physics) , optoelectronics , thermal , q factor , acoustics , electrical engineering , engineering , telecommunications , physics , meteorology , particle physics , antenna (radio)
This paper presents some methods to improve the resonance characteristics of film bulk acoustic‐wave resonator (FBAR) devices. The FBAR devices were fabricated on Bragg reflectors. Thermal treatments were done using sintering and/or annealing processes. The measurement shows a considerable improvement of return loss ( S 11 ) and quality factor ( Q s / p ). These thermal treatments seem very promising for enhancing the FBAR's resonance performance. © 2005 Wiley Periodicals, Inc. Microwave Opt Technol Lett 47: 459–462, 2005; Published online in Wiley InterScience (www.interscience.wiley.com). DOI 10.1002/mop.21199