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Reflection and transmission ellipsometry data analysis for measuring the complex permittivity of a single‐layer material at microwave frequencies
Author(s) -
Sagnard F.,
Seetharamdoo D.,
Le Glaunec V.
Publication year - 2002
Publication title -
microwave and optical technology letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.304
H-Index - 76
eISSN - 1098-2760
pISSN - 0895-2477
DOI - 10.1002/mop.10346
Subject(s) - microwave , permittivity , ellipsometry , reflection (computer programming) , planar , materials science , optics , reflection coefficient , angle of incidence (optics) , transmission (telecommunications) , transmission line , microwave transmission , transmission coefficient , electronic engineering , optoelectronics , dielectric , electrical engineering , engineering , computer science , physics , telecommunications , thin film , computer graphics (images) , programming language , nanotechnology
For in situ measurement of the complex permittivity of planar materials, a free‐space system based on reflection or transmission ellipsometry has been developed and extended to microwave frequencies. Different angles of incidence were studied in the range [35–50°]. Original numerical methods based on contour‐line charts and least‐square optimization have been developed. © 2002 Wiley Periodicals, Inc. Microwave Opt Technol Lett 33: 443–448, 2002; Published online in Wiley InterScience (www.interscience.wiley.com). DOI 10.1002/mop.10346