Reflection and transmission ellipsometry data analysis for measuring the complex permittivity of a single‐layer material at microwave frequencies | Zendy

Sagnard F. | Zendy; Seetharamdoo D. | Zendy; Le Glaunec V. | Zendy

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Reflection and transmission ellipsometry data analysis for measuring the complex permittivity of a single‐layer material at microwave frequencies

Author(s) -

Sagnard F.,

Seetharamdoo D.,

Le Glaunec V.

Publication year - 2002

Publication title -

microwave and optical technology letters

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.304

H-Index - 76

eISSN - 1098-2760

pISSN - 0895-2477

DOI - 10.1002/mop.10346

Subject(s) - microwave , permittivity , ellipsometry , reflection (computer programming) , planar , materials science , optics , reflection coefficient , angle of incidence (optics) , transmission (telecommunications) , transmission line , microwave transmission , transmission coefficient , electronic engineering , optoelectronics , dielectric , electrical engineering , engineering , computer science , physics , telecommunications , thin film , computer graphics (images) , programming language , nanotechnology

For in situ measurement of the complex permittivity of planar materials, a free‐space system based on reflection or transmission ellipsometry has been developed and extended to microwave frequencies. Different angles of incidence were studied in the range [35–50°]. Original numerical methods based on contour‐line charts and least‐square optimization have been developed. © 2002 Wiley Periodicals, Inc. Microwave Opt Technol Lett 33: 443–448, 2002; Published online in Wiley InterScience (www.interscience.wiley.com). DOI 10.1002/mop.10346

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