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Effect of guard‐ring on the DC and high‐frequency performance of deep‐submicrometer metal oxide semiconductor field effect transistor
Author(s) -
Sun Ling,
Gao Jianjun,
Werthof Andreas
Publication year - 2014
Publication title -
international journal of rf and microwave computer‐aided engineering
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.335
H-Index - 39
eISSN - 1099-047X
pISSN - 1096-4290
DOI - 10.1002/mmce.20757
Subject(s) - materials science , transistor , optoelectronics , microwave , field effect transistor , wafer , mosfet , semiconductor , cmos , electrical engineering , electronic engineering , engineering , voltage , telecommunications
The influence of guard‐ring (GR) on the direct current (DC) and high‐frequency performance of deep‐submicrometer metal oxide semiconductor field effect transistors (MOSFETs) is investigated in this study. MOSFETs with four different GRs are fabricated using 90 nm complementary metal oxide semiconductor (CMOS) process, and a detailed comparative study on their device performances is performed. A united DC and small signal equivalent circuit model that takes into the effect of GR is developed. A set of simple, but efficient formulas provide a bidirectional bridge for the S parameters transformation between devices with different GRs. The corresponding model parameters for MOSFETs with different GRs are determined from S parameter on‐wafer measurement up to 40 GHz. © 2013 Wiley Periodicals, Inc. Int J RF and Microwave CAE 24:259–267, 2014.