Premium
High isolation microstrip GaN‐HEMT Single‐FET Switch
Author(s) -
Ciccognani Walter,
Ferrari Mauro,
Limiti Ernesto
Publication year - 2010
Publication title -
international journal of rf and microwave computer‐aided engineering
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.335
H-Index - 39
eISSN - 1099-047X
pISSN - 1096-4290
DOI - 10.1002/mmce.20443
Subject(s) - high electron mobility transistor , microwave , insertion loss , microstrip , optoelectronics , bandwidth (computing) , isolation (microbiology) , materials science , monolithic microwave integrated circuit , transmission line , electrical engineering , electronic engineering , topology (electrical circuits) , engineering , transistor , telecommunications , amplifier , voltage , microbiology and biotechnology , biology , cmos
In this contribution an analytical approach to the design of high‐isolation microwave transmission line‐resonated switches is presented. Simulated and measured performance of a GaN HEMT single‐FET switch cell topology and the one of a complete SPDT using the proposed approach are presented to demonstrate the approach feasibility and effectiveness. The resulting SPDT, operating at X Band, is featured by 1 dB insertion loss, isolation better than 37 dB all over the operating bandwidth and a power handling capability higher than 39 dBm. © 2010 Wiley Periodicals, Inc. Int J RF and Microwave CAE, 2010.
Accelerating Research
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom
Address
John Eccles HouseRobert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom