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Tribologische Eigenschaften dünner Schichten aus TaCN und TaN
Author(s) -
Yan X. H.,
Yin J.,
Cheng X. N.,
Liu J. Q.
Publication year - 2013
Publication title -
materialwissenschaft und werkstofftechnik
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.285
H-Index - 38
eISSN - 1521-4052
pISSN - 0933-5137
DOI - 10.1002/mawe.201300985
Subject(s) - thin film , materials science , tribology , scanning electron microscope , sputter deposition , amorphous solid , composite material , wafer , nanoindentation , analytical chemistry (journal) , sputtering , elastic modulus , crystallography , nanotechnology , chemistry , chromatography
Abstract The amorphous Ta‐C‐N and Ta‐N thin films were deposited using magnetron sputtering on silicon wafer under the similar condition. The as‐prepared thin films were characterized using scanning electron microscope (SEM), optical profiling system, nano‐indentation and friction test instruments. The results show that, compared with the Ta‐N thin film, the Ta‐C‐N thin film has higher nano‐hardness (9.45 GPa) and elastic modulus (225.71 GPa). Furthermore, the lower friction coefficient and wear rate of the Ta‐C‐N thin film are 0.238 and 5.94×10 –6 mm –3 · N –1 ·m –1 , respectively. The wear surface of Ta‐C‐N thin film is smoother than that of the Ta‐N thin film. Therefore, it shows better anti‐wear properties.