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Einfluss der elektrischen Substrat‐Vorspannung auf die Stöchiometrie und Struktur von Silber‐dotierten Calciumphosphat‐Beschichtungen, hergestellt durch RF‐Magnetron Sputtern
Author(s) -
Ivanova A. A.,
Surmeneva M. A.,
Grubova I. Y.,
Sharonova A. A.,
Pichugin V. F.,
Chaikina M. V.,
Buck V.,
Prymak O.,
Epple M.,
Surmenev R. A.
Publication year - 2013
Publication title -
materialwissenschaft und werkstofftechnik
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.285
H-Index - 38
eISSN - 1521-4052
pISSN - 0933-5137
DOI - 10.1002/mawe.201300101
Subject(s) - stoichiometry , substrate (aquarium) , materials science , sputter deposition , scanning electron microscope , sputtering , coating , cavity magnetron , analytical chemistry (journal) , ellipsometry , thin film , composite material , chemistry , nanotechnology , oceanography , chromatography , geology , organic chemistry
A coating on the basis of silver‐containing hydroxyapatite (silver‐hydroxyapatite) was deposited by radio frequency (RF) magnetron sputtering. X‐ray diffractometry, scanning electron microscopy, energy‐dispersive X‐ray spectroscopy, and ellipsometry were used to analyse the change in structure and stoichiometry of the coatings upon the change of the negative electrical bias (–50 V and –100 V) on the substrate. The chemical composition of the sputter‐deposited coating was identical to the target. However, an increase in the negative electrical bias on the substrate led to a decrease of the coating thickness. In addition, the average size of the grains decreased from 55 ± 15 nm (grounded substrate) up to 30 ± 10 nm when an electrical bias of –100 V was applied.