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Electrochemical behavior of vanadium in EDTA
Author(s) -
Ameer Magda A. M.
Publication year - 2003
Publication title -
materialwissenschaft und werkstofftechnik
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.285
H-Index - 38
eISSN - 1521-4052
pISSN - 0933-5137
DOI - 10.1002/mawe.200390115
Subject(s) - vanadium , ascorbic acid , capacitance , immersion (mathematics) , chemistry , metal , electrochemistry , dielectric spectroscopy , chelation , inorganic chemistry , corrosion , reducing agent , analytical chemistry (journal) , chemical engineering , materials science , nuclear chemistry , chromatography , electrode , organic chemistry , food science , mathematics , pure mathematics , engineering
The use of chelating agents as cleaning chemicals to remove metal deposits is gaining interest. In this study the Electrochemical behavior of vanadium in EDTA, EA and EAC solutions was studied using AC impedance technique at different immersion time. The results indicate that the values of R ct for EA solution are higher than that for EDTA and EAC. This may be due to the presence of ascorbic acid as reducing agent. The presence of surface film is confirmed by capacitance measurements. It is shown that the capacitance is time‐dependent. Generally, the capacitance decreases with immersion time and this can be discussed on the basis that the concentration of vanadium ions at the interface increases with immersion time.