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Ellipsometry and Other Reflection Techniques
Author(s) -
Visscher W. H. M.
Publication year - 1973
Publication title -
materialwissenschaft und werkstofftechnik
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.285
H-Index - 38
eISSN - 1521-4052
pISSN - 0933-5137
DOI - 10.1002/mawe.19730040605
Subject(s) - ellipsometry , reflection (computer programming) , materials science , metal , reflectivity , optics , electrolyte , oxide , spectroscopy , thin film , optoelectronics , metallurgy , nanotechnology , chemistry , electrode , computer science , physics , programming language , quantum mechanics
A survey is given of some optical methods that are used to investigate the metal surface and thin oxide films on the metal. These optical techniques allow observation of the film during the actual process of film growth on the metal in a metal/electrolyte or metal/gas system. Besides ellipsometry multiple reflection, modulated reflectance spectroscopy and internal reflectance spetroscopy are discussed.

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