Premium
Cover Picture: Macromol. Theory Simul. 6∕2015
Author(s) -
Mohagheghi Mouge,
Khomami Bamin
Publication year - 2015
Publication title -
macromolecular theory and simulations
Language(s) - English
Resource type - Reports
SCImago Journal Rank - 0.37
H-Index - 56
eISSN - 1521-3919
pISSN - 1022-1344
DOI - 10.1002/mats.201570018
Subject(s) - materials science , microelectronics , lithography , polymer , metastability , nanotechnology , substrate (aquarium) , perpendicular , template , etching (microfabrication) , thin film , cover (algebra) , optoelectronics , composite material , chemistry , layer (electronics) , mechanical engineering , engineering , oceanography , geometry , organic chemistry , mathematics , geology
Cover: Microelectronic manufacturing with block polymers is rapidly approaching commercialization. Highly controllable, uniform, and inexpensive nano‐lithographic templates can be created, and the pattern from the selfassembled thin film can be transferred to the underlying substrate by reactive ion etching, creating morphologies with long‐range order. Equilibrium morphologies of linear ABC triblock polymer melts both in bulk and under confinement are investigated. Specifically, the surface interaction and film thickness for highly sought‐after perpendicular lamellae are delineated. Unstable and metastable morphologies are also identified and discussed. Further details can be found in the article by M. Mohagheghi and B. Khomami* on page 556 .