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Phase‐Field Simulation of Long‐Wavelength Line Edge Roughness in Diblock Copolymer Resists
Author(s) -
Bosse August W.
Publication year - 2010
Publication title -
macromolecular theory and simulations
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.37
H-Index - 56
eISSN - 1521-3919
pISSN - 1022-1344
DOI - 10.1002/mats.201000018
Subject(s) - mesophase , resist , copolymer , materials science , wavelength , lamellar structure , surface finish , phase (matter) , optics , field (mathematics) , scattering , line (geometry) , wavenumber , spectral line , lamellar phase , molecular physics , composite material , physics , polymer , geometry , optoelectronics , liquid crystal , pure mathematics , mathematics , layer (electronics) , quantum mechanics , astronomy
We examine stochastic computer simulations of the Leibler‐Ohta‐Kawasaki (LOK) phase‐field model1, 2 and demonstrate that long‐wavelength line edge roughness (LER) and line width roughness (LWR) in a lamellar diblock copolymer resist depend monotonically on quench depth and noise strength, and that the LER and LWR spectra both exhibit a peak at k 0 –the characteristic wavenumber of mesophase separation in diblock copolymers. For k ⪅ k 0 , we find that the LER spectrum approximately scales like k −1.6 . These observations are consistent with previous theoretical, computational, and experimental examinations LER and LWR in diblock copolymer melts, and thus the LOK phase‐field model should be considered a capable and appropriate framework for future examination of long‐wavelength LER and LWR in block copolymer resist systems.