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Simulation of 2D Interference Pattern Structure for Rectangular and Circular Slits Using Dual Beam Interference Technique
Author(s) -
Pandey Girijesh Narayan,
Shukla Anil Kumar,
Thapa Khem B.,
Singh Munendra,
Singh Ram Chandra
Publication year - 2021
Publication title -
macromolecular symposia
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.257
H-Index - 76
eISSN - 1521-3900
pISSN - 1022-1360
DOI - 10.1002/masy.202100001
Subject(s) - slit , interference (communication) , optics , interference lithography , materials science , beam (structure) , dual (grammatical number) , lithography , physics , computer science , fabrication , telecommunications , medicine , art , channel (broadcasting) , alternative medicine , literature , pathology
Laser interference lithography (LIL) is known to be based completely on the dual‐beam interference (DBI) technique. In this present work, a 2D interference pattern structure for rectangular and circular slits is simulated. The proposed 2D pattern structure is optimized by varying the slit width and slit separation. Several fringe patterns following the varying slit width and slit separation are reported.