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High Temperature Crystal Growth: An Overview
Author(s) -
Dagdale Shivaji,
Pahurkar Vikas,
Muley Gajanan
Publication year - 2016
Publication title -
macromolecular symposia
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.257
H-Index - 76
eISSN - 1521-3900
pISSN - 1022-1360
DOI - 10.1002/masy.201400254
Subject(s) - crystallization , crystal growth , materials science , crystal (programming language) , czochralski method , seed crystal , atmospheric temperature range , solid state , oxide , nanotechnology , single crystal , chemical engineering , crystallography , chemistry , thermodynamics , computer science , metallurgy , programming language , physics , engineering
Summary In this review, main advances produced in crystal growth techniques during recent years have been presented. The most commonly used methods for growth of solid‐state lasers and nonlinear optical crystals of oxide materials are discussed. The crystals grown by high temperature solution growth method has got vital importance, because of their useful applications. The high temperature crystal growth methods involve liquid – solid phase transformation. These may range from a small inexpensive technique to a complex sophisticated expensive process. The crystallization time may ranges from minutes, hours, days and to months. Besides, the various methods, Czochralski, top‐seeded solution growth (TSSG), and Bridgeman are some of the most popular methods, used to grow single crystals have been discussed here. The ambient temperature conditions used to melt grown materials or become polymorphic transitions below the crystallization temperature are presented. Regarding to it, various crystals grown by researchers with high temperature crystal growth method have been reviewed.