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Tailored Morphologies of Poly(styrene‐ block ‐butadiene‐ block ‐methyl methacrylate) Triblock Copolymers and Their Blends with Polystyrene Homopolymers
Author(s) -
Martin L.,
Irusta L.,
González A.,
Kortaberria G.,
Tercjak A.
Publication year - 2012
Publication title -
macromolecular symposia
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.257
H-Index - 76
eISSN - 1521-3900
pISSN - 1022-1360
DOI - 10.1002/masy.201251121
Subject(s) - copolymer , materials science , polystyrene , methyl methacrylate , styrene , polymer chemistry , ternary operation , methacrylate , polymer blend , nanoscopic scale , polymer , chemical engineering , nanotechnology , composite material , computer science , engineering , programming language
Summary: Self‐assembly is an interesting strategy for the creation of periodic structures at the nanoscale. The microphase separation in a linear ternary block copolymer consisting on three immiscible components (ABC), give rise to the formation of different final morphologies that can be controlled by various parameters. In this work, the morphologies of three poly(styrene‐ b ‐butadien‐ b ‐methyl methacrylate) triblock copolymers with similar molecular weight and their blends with PS homopolymers were studied by atomic force microscopy (AFM). Redistribution of the homopolymer in blends generates new structures could be tailored according to the desired applications.