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3D Stereolithography by Using Two‐Photon Photopolymerization
Author(s) -
Kim Ran Hee,
Lee KwangSup
Publication year - 2010
Publication title -
macromolecular symposia
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.257
H-Index - 76
eISSN - 1521-3900
pISSN - 1022-1360
DOI - 10.1002/masy.201000026
Subject(s) - stereolithography , photopolymer , lithography , materials science , microelectromechanical systems , polymerization , photon , fabrication , two photon excitation microscopy , nanotechnology , photolithography , optoelectronics , optics , polymer , physics , composite material , medicine , alternative medicine , pathology , fluorescence
Summary: This article describes the development and evolution of two‐photon lithography of 3‐dimensional (3D) polymeric structures through two‐photon photopolymerization (TPP) and the materials used to facilitate the same. The first part elaborates on the advantages of TPP over conventional lithographic techniques used in the fabrication of 3D microelectromechanical systems (MEMS). The second part introduces the preparation of highly efficient organic two‐photon absorbing materials based on the centro‐symmetric π‐conjugated system and their performance as sensitizers in two‐photon polymerization.