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Photodegradation of Poly[methyl(phenyl)silylene] in the Presence of Modifying Substances
Author(s) -
Kochalska Anna,
Nožár Juraj,
Nešpůrek Stanislav,
Peter Jakub
Publication year - 2010
Publication title -
macromolecular symposia
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.257
H-Index - 76
eISSN - 1521-3900
pISSN - 1022-1360
DOI - 10.1002/masy.200900075
Subject(s) - photodegradation , silylene , radical , photochemistry , quantum yield , chemistry , degradation (telecommunications) , electron acceptor , peroxide , yield (engineering) , materials science , organic chemistry , photocatalysis , catalysis , silicon , telecommunications , physics , quantum mechanics , computer science , metallurgy , fluorescence
Summary: Efficiency of the photodegradation of poly[methyl(phenyl)silylene] can be increased by electron acceptor additives with unstable anion radicals. The best chain degradation yield was obtained using benzoyl peroxide as an additive. The model for the photodegradation process is supported by quantum chemical calculations.