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Preparation of Self‐Organized Porous Polymer Masks for Si Dry Etching
Author(s) -
Hirai Yuji,
Yabu Hiroshi,
Matsuo Yasutaka,
Ijiro Kuniharu,
Shimomura Masatsugu
Publication year - 2010
Publication title -
macromolecular symposia
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.257
H-Index - 76
eISSN - 1521-3900
pISSN - 1022-1360
DOI - 10.1002/masy.200900067
Subject(s) - dry etching , materials science , polymer , template , etching (microfabrication) , porosity , honeycomb , nanotechnology , chemical engineering , composite material , layer (electronics) , engineering
Summary: Self‐organized honeycomb‐patterned polymer films were prepared by using condensed water droplet arrays as templates. Porous polymer masks for dry etching were easily prepared on Si substrates by peeling off the honeycomb‐patterned films. After dry etching, hexagonally‐arranged micro‐pores were formed on the surface of Si substrates.