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Self‐Supporting Polymer Films for MEMS Applications
Author(s) -
Nocke Andreas,
Wolf Marcus,
Budzier Helmut,
Monch Jens,
Arndt KarlFriedrich,
Gerlach Gerald
Publication year - 2007
Publication title -
macromolecular symposia
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.257
H-Index - 76
eISSN - 1521-3900
pISSN - 1022-1360
DOI - 10.1002/masy.200750859
Subject(s) - photoresist , materials science , curing (chemistry) , polymer , fabrication , microelectromechanical systems , layer (electronics) , fourier transform infrared spectroscopy , composite material , nanotechnology , chemical engineering , medicine , alternative medicine , pathology , engineering
Summary: The fabrication of a self supporting novolac‐based photoresist layer is demonstrated. A technology is presented using a sacrificial layer of PMMA and a carrier layer of photosensitive PI. The solely use of polymers for the creation of a self‐supporting structure is distinguished by simple processing and relatively low cost materials. Additionally the mechanical stability of the self‐supporting layer is under consideration. Finally the cross‐linking process of the novolac‐based photoresist by curing is discussed using FTIR, DSC and TGA measurements.