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Poly(ferrocenylsilanes) as etch barriers in nano and microlithographic applications
Author(s) -
Hempenius Mark A.,
Lammertink Rob G.H.,
Péter Mária,
Vancso G. Julius
Publication year - 2003
Publication title -
macromolecular symposia
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.257
H-Index - 76
eISSN - 1521-3900
pISSN - 1022-1360
DOI - 10.1002/masy.200390175
Subject(s) - materials science , copolymer , template , nanoscopic scale , nanolithography , polystyrene , silicon , monolayer , nanotechnology , self assembly , etching (microfabrication) , chemical engineering , reactive ion etching , nano , self assembled monolayer , thin film , group 2 organometallic chemistry , polymer chemistry , polymer , organic chemistry , chemistry , layer (electronics) , molecule , composite material , fabrication , optoelectronics , medicine , alternative medicine , pathology , engineering
Abstract Thin films of organic‐organometallic block copolymers are shown to be efficient self‐assembled templates for nanolithography. Block copolymers composed of organic blocks such as polyisoprene or polystyrene and a poly(ferrocenylsilane) block microphase separate to form a monolayer of densely packed organometallic spheres in an organic matrix. The high resistance of the organometallic phase to reactive ion etching enables the nanoscale patterns to be transferred into silicon substrates, forming nano structured surfaces. Electrostatic self‐assembly of poly(ferrocenylsilane) polyanions and polycations is discussed as a means to form laterally structured organometallic multilayer thin films by area‐selective adsorption onto chemically patterned substrates.