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Photoacid‐generating sulfonyloxymaleimide polymers and their application to photoimaging
Author(s) -
Ahn KwangDuk,
Chung ChanMoon
Publication year - 1999
Publication title -
macromolecular symposia
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.257
H-Index - 76
eISSN - 1521-3900
pISSN - 1022-1360
DOI - 10.1002/masy.19991420115
Subject(s) - maleimide , polymer , sulfonic acid , polymer chemistry , chemistry , organic chemistry
Synthesis and properties of photoacid generating polymers based on four sulfonyloxymaleimides (RsOMI), N ‐(tosyloxy)maleimide (TsOMI), N ‐(methanesulfonyloxy)maleimide (MsOMI), N ‐(trifluoromethanesulfonyloxy)maleimide (TfOMI), and N ‐(10‐camphorsulfonyloxy)maleimide (CsOMI) are described. The RsOMI polymers photochemically produce corresponding sulfonic acids (RsOH), TsOH, MsOH, TfOH and 10‐camphorsulfonic acid (CSA) which can catalyze deprotection of the acid‐labile t‐BOC groups in the same polymer chains via a chemical amplification process. The photoacid generating polymers with concurrent acid‐labile groups offer great potential for applications in functional transformation and photoimaging.