Premium
Fluorinated heteroaromatic polyethers for low dielectric constant / high temperature applications
Author(s) -
Maier Gerhard,
Haußmann Jörg,
Dietlmeier Marcus,
Banerjee Susanta
Publication year - 1999
Publication title -
macromolecular symposia
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.257
H-Index - 76
eISSN - 1521-3900
pISSN - 1022-1360
DOI - 10.1002/masy.19991420110
Subject(s) - arylene , dielectric , hexafluorobenzene , thermal stability , materials science , ether , polymer chemistry , solubility , polymerization , chemical engineering , composite material , organic chemistry , chemistry , polymer , molecule , alkyl , optoelectronics , engineering , aryl
Several series of poly(arylene ether)s with trifluoromethyl substituents were prepared and characterized. These materials are potential candidates for the use as low dielectric constant insulators (intermetal dielectrics, IMD, and interlayer dielectrics, ILD) on microchips. Thermal stability up to 450 °C and a dielectric constant below 3 preferably below 2.5) is required for this application. The thermal stability of the poly(arylene ether)s was increased from 320°C to more than 500 °C by optimization of the structure of the repeating unit. The dielectric constant of one of the most promising structures was determined to be 2.8. In addition, plasma polymerized thin films from hexafluorobenzene, tetrafluorobenzene, perfluorotoluene and perfluorodecaline were prepared and characterized with respect to solubility, dielectric constant, adhesion, and thermal stability.