Premium
Plasma deposition of silicon‐containing layers on polymer substrates
Author(s) -
Garbassi Fabio,
Occhiello Ernesto
Publication year - 1999
Publication title -
macromolecular symposia
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.257
H-Index - 76
eISSN - 1521-3900
pISSN - 1022-1360
DOI - 10.1002/masy.19991390112
Subject(s) - silicon , polymer , materials science , ternary operation , monomer , plasma , deposition (geology) , chemical engineering , oxygen , polymerization , plasma polymerization , polymer chemistry , composite material , organic chemistry , chemistry , metallurgy , paleontology , physics , quantum mechanics , sediment , computer science , engineering , biology , programming language
Plasma‐polymerized coatings have been deposited on polymer substrates using mixtures of silicon‐containing monomers with O 2 and/or CF 4 . With ternary gas mixtures, novel silicon oxyfluoride coatings were obtained. By oxygen plasma post‐treatment, improvements in barrier properties of polymer substrates to gases were observed.