Premium
Grain boundary defects in block copolymer systems: Bulk and thin film results
Author(s) -
Carvalho Bruce L.,
Lescanec Robert L.,
Thomas Edwin L.
Publication year - 1995
Publication title -
macromolecular symposia
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.257
H-Index - 76
eISSN - 1521-3900
pISSN - 1022-1360
DOI - 10.1002/masy.199509801101
Subject(s) - copolymer , materials science , morphology (biology) , grain boundary , transmission electron microscopy , curvature , composite material , thin film , boundary (topology) , nanotechnology , microstructure , polymer , geometry , mathematics , mathematical analysis , genetics , biology
Ordered periodic morphologies are the hallmark of most discussions of the microphase‐separated state in block copolymer systems yet actual materials contain a myriad of defects. Perhaps the most important of these defects are those which constitute the regions between ordered grains. Transmission electron microscopy (TEM) is used to investigate the grain boundary morphology of diblock copolymers in both bulk and thin film geometries. These experiments show that constant mean curvature (CMC) surfaces are often useful descriptors, not only for the equilibrium morphology of microphase‐separated copolymers, but also for the microphase‐separated morphology within grain boundaries.