Premium
Dedicated polymers for future progress in microelectronics
Author(s) -
Rubner Roland,
Ahne Hellmut,
Sebald Michael,
Sezi Recai
Publication year - 1992
Publication title -
makromolekulare chemie. macromolecular symposia
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.257
H-Index - 76
eISSN - 1521-3900
pISSN - 0258-0322
DOI - 10.1002/masy.19920640107
Subject(s) - photoresist , microelectronics , miniaturization , nanotechnology , photolithography , polymer , materials science , process engineering , engineering , composite material , layer (electronics)
The continuous miniaturization in microelectronics requires advanced materials and processes. Novel specifically functionalized anhydride‐containing filmforming polymers which spontaneously react with bisaminoalkylsiloxanes were synthesized for use in photolithographic processes. This allows the modelling of photoresist patterns and thus enhancement of practical resolution. In addition, efficient polymeric dielectrics with improved solubility in environmentally safe solvents were developed. The latter can be patterned using the above mentioned photolithographic process.