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Photoablation experiments of thin polysilane‐films prepared by the Langmuir‐Blodgett‐Kuhn technique
Author(s) -
Sawodny M.,
Embs F.,
Miller R. D.,
Aussenegg F.,
Stumpe J.,
Wegner G.,
Knoll W.
Publication year - 1991
Publication title -
makromolekulare chemie. macromolecular symposia
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.257
H-Index - 76
eISSN - 1521-3900
pISSN - 0258-0322
DOI - 10.1002/masy.19910460131
Subject(s) - polysilane , langmuir–blodgett film , materials science , photochemistry , quenching (fluorescence) , langmuir , irradiation , kinetics , fluorescence , chemical engineering , chemistry , monolayer , nanotechnology , optics , composite material , adsorption , polymer , physics , quantum mechanics , nuclear physics , engineering
We give a brief survey of our recent research on polysilane Langmuir‐Blodgett‐Kuhn films. Surface‐plasmon experiments, IR and flourescence‐lifetime measurements have been performed to study the complex photophysical and photochemical processes in these materials following UV irradiation. Quenching effects of the polysilane backbone and their influence on the ablation‐kinetics are discussed.