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Conductive properties induced by ion beams in polyimide films
Author(s) -
Davenas J.,
Xu X. L.,
Boiteux G.
Publication year - 1989
Publication title -
makromolekulare chemie. macromolecular symposia
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.257
H-Index - 76
eISSN - 1521-3900
pISSN - 0258-0322
DOI - 10.1002/masy.19890240122
Subject(s) - polyimide , materials science , polymer , resist , electrical conductor , ion beam , lithography , doping , electronics , irradiation , ion , optoelectronics , surface modification , nanotechnology , conductive polymer , composite material , chemical engineering , chemistry , organic chemistry , physics , layer (electronics) , nuclear physics , engineering
Ion beams have become of widespread use for the modification of surface layers, in particular in electronics where they constitute the main technique for doping semiconductors. Ionizing radiations have also been widely used for the exposure of polymeric resists in lithography. From these reasons resulted an increasing interest for the study of the modifications induced by the ion beam irradiation of polymers (1). Polyimide was considered since heat resistant polymers are required for applications in electronics. The purpose of this work was to combine the processibility of a common polymer which exhibits excellent insulating properties, with ion beams which may induce locally conductive properties by the use of microbeams.