Premium
Ablative photodecomposition and modification of polymer surfaces with the excimer laser radiation
Author(s) -
Lazare S.,
Granier V.
Publication year - 1988
Publication title -
makromolekulare chemie. macromolecular symposia
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.257
H-Index - 76
eISSN - 1521-3900
pISSN - 0258-0322
DOI - 10.1002/masy.19880180118
Subject(s) - materials science , ablation , polymer , excimer , laser , excimer laser , microelectronics , laser ablation , surface modification , optoelectronics , optics , composite material , chemical engineering , physics , engineering , aerospace engineering
Ablative Photodecomposition of organic polymers, discovered by Srinivasan (IBM, USA) in 1982, is the object of intense research. This spontaneous ablation obtained by absorption of the high intensity, pulsed, far‐UV, radiation of the excimer laser allows micro‐ and submicroscopic etching of heat‐sensitive and soft materials (polymers and living tissue). Numerous applications are foreseen in various fields like microelectronics and microsurgery. Applications in basic research are also being developed. For instance, changes of the morphology of the surface by ablation give information on the microstructure in poly(ethylene terephthalate) films. The present status of the mechanism is described.