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High‐Fidelity, Sub‐5 nm Patterns from High‐χ Block Copolymer Films with Vapor‐Deposited Ultrathin, Cross‐Linked Surface‐Modification Layers
Author(s) -
Wang Hyun Suk,
Oh Seula,
Choi Junhwan,
Jang Wontae,
Kim Ki Hyun,
Arellano Carlos Luis,
Huh June,
Bang Joona,
Im Sung Gap
Publication year - 2020
Publication title -
macromolecular rapid communications
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.348
H-Index - 154
eISSN - 1521-3927
pISSN - 1022-1336
DOI - 10.1002/marc.202070008
Subject(s) - copolymer , materials science , chemical vapor deposition , perpendicular , surface modification , thin film , polymer chemistry , block (permutation group theory) , chemical engineering , nanotechnology , composite material , polymer , geometry , mathematics , engineering
Front Cover : In article 1900514 by Joona Bang, Sung Gap Im, and co‐workers, a robust neutralization methodology is developed to neutralize the two interfaces in a block copolymer film via initiated chemical vapor deposition. A highly uniform film of crosslinked AB‐type random copolymers, sandwich an AB‐type block copolymer film to produce perpendicular sub‐5 nm nanodomains.