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Electroless Deposition of Nickel on Photografted Polymeric Microscale Patterns
Author(s) -
Carroll Gregory T.,
Lancaster Jeffrey R.,
Turro Nicholas J.,
Koberstein Jeffrey T.,
Mammana Angela
Publication year - 2017
Publication title -
macromolecular rapid communications
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.348
H-Index - 154
eISSN - 1521-3927
pISSN - 1022-1336
DOI - 10.1002/marc.201600564
Subject(s) - nickel , acrylic acid , catalysis , materials science , adsorption , polymer chemistry , monolayer , phthalimide , self assembled monolayer , microscale chemistry , chemical engineering , substrate (aquarium) , deposition (geology) , electroless nickel plating , chemistry , nanotechnology , copolymer , polymer , electroless plating , layer (electronics) , organic chemistry , electroplating , composite material , engineering , biology , paleontology , metallurgy , mathematics education , sediment , geology , mathematics , oceanography
This report demonstrates the electroless deposition of Ni onto micropatterns of poly (acrylic acid) (PAA) photografted to phthalimide‐terminated self‐assembled monolayers (SAMs). PAA is spin‐coated onto phthalimide SAMs and covered with a photomask. UV irradiation selectively binds PAA to exposed regions of the surface, allowing PAA on unexposed regions to be rinsed off. A Pd catalyst is then selectively adsorbed to regions of the surface where PAA is bound. The adsorbed catalyst selectively initiates Ni plating upon immersion of the substrate into a Ni(SO 4 ) bath.