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Modification Pathways for Copoly(2‐oxazoline)s Enabling Their Application as Antireflective Coatings in Photolithography
Author(s) -
Fimberger Martin,
Behrendt Andreas,
Jakopic Georg,
Stelzer Franz,
Kumbaraci Volkan,
Wiesbrock Frank
Publication year - 2016
Publication title -
macromolecular rapid communications
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.348
H-Index - 154
eISSN - 1521-3927
pISSN - 1022-1336
DOI - 10.1002/marc.201500589
Subject(s) - photoresist , photolithography , materials science , copolymer , polymer chemistry , chromophore , oxazoline , polymer , photochemistry , chemistry , nanotechnology , organic chemistry , catalysis , composite material , layer (electronics)
Chromophore‐functionalized copoly(2‐oxazoline)s are successfully evaluated as bottom antireflective coatings (BARCs) in high‐resolution photolithography. With respect to UV light sources used in photolithographic production routines, anthracene is chosen as a chromophore. For application as polymer in BARCs, the copolymer poly(2‐ethyl‐2‐oxazolin) 45 ‐ stat ‐poly(2‐dec‐9′‐enyl‐2‐oxazolin) 20 ‐ stat ‐poly(2‐(3′‐(1″‐(anthracen‐9‐ylmethyl)‐1″,2″,3″‐triazol‐4‐yl)propyl)‐2‐oxazolin) 35 can be synthesized by the Huisgen cycloaddition click reaction of the copolymer poly(2‐ethyl‐2‐oxazolin) 45 ‐ stat ‐poly(2‐dec‐9′‐enyl‐2‐oxazolin) 20 ‐ stat ‐poly(2‐pent‐4′‐inyl‐2‐oxazolin) 35 and the corresponding azide‐functionalized anthracenes. These copolymers can be crosslinked by the thermally induced thiol‐ene reaction involving the unsaturated C=C bonds of the poly(2‐dec‐9′‐enyl‐2‐oxazoline) repetition units and a multifunctional thiol as crosslinker. Tests of this BARC in a clean room under production conditions reveal a significant decrease of the swing‐curve of a chemically amplified positive photoresist by more than 50%, hence significantly increasing the resolution of the photoresist.