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Simultaneous Chemical and Optical Patterning of Polyacrylonitrile Film by Vapor‐Based Reaction
Author(s) -
Shin JaeWon,
Lee Choonghyeon,
Cha SangHo,
Jang Jyongsik,
Lee Kyung Jin
Publication year - 2015
Publication title -
macromolecular rapid communications
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.348
H-Index - 154
eISSN - 1521-3927
pISSN - 1022-1336
DOI - 10.1002/marc.201500078
Subject(s) - polyacrylonitrile , photoluminescence , materials science , chemical vapor deposition , polydimethylsiloxane , imine , photochemistry , derivatization , chemical engineering , nanotechnology , chemistry , polymer , organic chemistry , optoelectronics , catalysis , high performance liquid chromatography , engineering , composite material
The surface of polyacrylonitrile (PAN) film is treated with ethyleneamines (EDA) in a simple chemical vapor phase reaction. Successful introduction of amine functional groups on the cyano group of PAN backbone is verified by FT‐IR and NMR measurements. Further UV‐vis and photoluminescence analyses show a red shift of the emission peak after repeated EDA treatment, which might be attributed to the formation of imine conjugation from newly formed carbon‐nitrogen bonds on the PAN backbone. Further confocal laser scanning microscopy reveals that selective patterning of EDA on PAN films is possible via local polydimethylsiloxane masking. The results indicate that both chemical and optical patterning on PAN film can be realized via a single reaction and show the potential of this novel methodology in selective patterning.