Conjugated Polymer Patterning through Photooxidative Backbone Cleavage | Zendy

Johnson Ross S. | Zendy; Haworth Jacob J. | Zendy; Finnegan Patrick S. | Zendy; Wheeler David R. | Zendy; Dirk Shawn M. | Zendy

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Conjugated Polymer Patterning through Photooxidative Backbone Cleavage

Author(s) -

Johnson Ross S.,

Haworth Jacob J.,

Finnegan Patrick S.,

Wheeler David R.,

Dirk Shawn M.

Publication year - 2014

Publication title -

macromolecular rapid communications

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 1.348

H-Index - 154

eISSN - 1521-3927

pISSN - 1022-1336

DOI - 10.1002/marc.201400133

Subject(s) - xanthate , polymer , conjugated system , materials science , resist , cleavage (geology) , polymer chemistry , copolymer , photochemistry , linker , chemistry , nanotechnology , layer (electronics) , fracture (geology) , computer science , composite material , operating system

Photolithographic patterning of a xanthate precursor to poly(3,4‐diphenyl‐2,5‐thienylene vinylene) is described. Unlike xanthate precursors to poly( p ‐phenylene vinylene), the thienylene vinylene analogue patterns as a positive tone resist. Characterization of irradiated films reveals photooxidative cleavage of the vinylene linker decreases the molecular weight of the polymer (increasing the solubility of the UV‐exposed areas). As a result of the mechanism, the developed pattern sees no UV light exposure, which is a significant advantage compared with negative‐tone‐conjugated polymer resists. Single micron resolution of a low‐bandgap polymer is achieved in an efficient and scalable process.

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