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3D Photofixation Lithography in Diels–Alder Networks
Author(s) -
Adzima Brian J.,
Kloxin Christopher J.,
DeForest Cole A.,
Anseth Kristi S.,
Bowman Christopher N.
Publication year - 2012
Publication title -
macromolecular rapid communications
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.348
H-Index - 154
eISSN - 1521-3927
pISSN - 1022-1336
DOI - 10.1002/marc.201200599
Subject(s) - polymer , diels–alder reaction , lithography , monomer , materials science , viscosity , resist , adduct , polymer chemistry , modulus , photoresist , photopolymer , nanotechnology , chemistry , organic chemistry , composite material , optoelectronics , catalysis , layer (electronics)
3D structures are written and developed in a crosslinked polymer initially formed by a Diels–Alder reaction. Unlike conventional liquid resists, small features cannot sediment, as the reversible crosslinks function as a support, and the modulus of the material is in the MPa range at room temperature. The support structure, however, can be easily removed by heating the material, and depolymerizing the polymer into a mixture of low‐viscosity monomers. Complex shapes are written into the polymer network using two‐photon techniques to spatially control the photoinitiation and subsequent thiol–ene reaction to selectively convert the Diels–Alder adducts into irreversible crosslinks.