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Polymer Nanostructures Made by Scanning Probe Lithography: Recent Progress in Material Applications
Author(s) -
Xie Zhuang,
Zhou Xuechang,
Tao Xiaoming,
Zheng Zijian
Publication year - 2012
Publication title -
macromolecular rapid communications
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.348
H-Index - 154
eISSN - 1521-3927
pISSN - 1022-1336
DOI - 10.1002/marc.201100761
Subject(s) - nanotechnology , lithography , materials science , polymer , resist , nanostructure , scanning probe microscopy , optoelectronics , composite material , layer (electronics)
Scanning probe lithography (SPL) is a series of techniques that utilizes a scanning probe or an array of probes for surface patterning. Recent developments of new material systems and patterning approaches have made SPL a promising, low‐cost, bench‐top, and versatile tool for fabricating various polymer nanostructures, with extraordinary importance in physical sciences, life sciences and nanotechnology. This feature article highlights the recent progress in four material applications: polymer resists, polymeric carriers for patterning functional materials, electronically active polymers and polymer brushes for tailoring surface morphology and functionality. An overview of future possibilities, with regard to challenges and opportunities in this field, is given at the end of the paper.