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Morphology Tailoring of Thin Film Block Copolymers on Patterned Substrates
Author(s) -
Ye Xianggui,
Edwards Brian J.,
Khomami Bamin
Publication year - 2012
Publication title -
macromolecular rapid communications
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.348
H-Index - 154
eISSN - 1521-3927
pISSN - 1022-1336
DOI - 10.1002/marc.201100744
Subject(s) - copolymer , morphology (biology) , materials science , thin film , polymer science , block (permutation group theory) , polymer chemistry , chemical engineering , nanotechnology , composite material , polymer , genetics , mathematics , biology , engineering , geometry
Abstract It is well known that chemically patterned substrates can direct the assembly of adsorbed layers or thin films of block copolymers. For a cylinder‐forming diblock copolymer on periodically spot‐patterned substrates, the morphology of the block copolymer follows the pattern at the substrate; however, with different periodic spacing and spot size of the pattern, novel morphologies can be created. Specifically, we have demonstrated that new morphologies that are absent in the bulk system can be tailored by judiciously varying the mismatch between the width of the pattern and the periodic spacing of the bulk block copolymer, the top surface affinity, and spot size. New morphologies can thus be achieved, such as honeycomb and ring structures, which do not appear in the bulk system. These results demonstrate a promising strategy for fabrication of new nanostructures from chemically patterned substrates.