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Functionalized Nanoporous Thin Films From Photocleavable Block Copolymers
Author(s) -
Schumers JeanMarc,
Vlad Alexandru,
Huynen Isabelle,
Gohy JeanFrançois,
Fustin CharlesAndre
Publication year - 2012
Publication title -
macromolecular rapid communications
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.348
H-Index - 154
eISSN - 1521-3927
pISSN - 1022-1336
DOI - 10.1002/marc.201100739
Subject(s) - copolymer , materials science , nanoporous , fluorescence , photoresist , polystyrene , thin film , chemical engineering , ethylene oxide , polymer chemistry , polymer , nanotechnology , composite material , optics , physics , engineering , layer (electronics)
A polystyrene‐ block ‐poly(ethylene oxide) block copolymer bearing a photocleavable junction between the blocks is used to form nanoporous thin films with carboxylic acid functions homogeneously distributed on the pore walls. The presence of the carboxylic acid groups is evidenced by fluorescence spectroscopy after their reaction with a diazomethane functionalized fluorescent dye. In addition, the initial light‐responsive thin film, acting as a photoresist, can be easily patterned to selectively generate porosity in predetermined areas. In that way, fluorescent patterns can be obtained as evidenced by fluorescent microscopy.