Selective and Sequential Re‐Assembly of Patterned Block Copolymer Thin Film for Fabricating Polymeric, Inorganic, and Their Composite Nanostructured Arrays | Zendy

Zu Xihong | Zendy; Gong Jian | Zendy; Tu Weiping | Zendy; Deng Yulin | Zendy

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Selective and Sequential Re‐Assembly of Patterned Block Copolymer Thin Film for Fabricating Polymeric, Inorganic, and Their Composite Nanostructured Arrays

Author(s) -

Zu Xihong,

Gong Jian,

Tu Weiping,

Deng Yulin

Publication year - 2011

Publication title -

macromolecular rapid communications

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 1.348

H-Index - 154

eISSN - 1521-3927

pISSN - 1022-1336

DOI - 10.1002/marc.201100313

Subject(s) - copolymer , materials science , nanoring , composite number , thin film , nanostructure , wafer , polymer , substrate (aquarium) , nanoparticle , styrene , chemical engineering , nanotechnology , polymer chemistry , composite material , oceanography , geology , engineering

We report that the nanostructures of poly(styrene‐ block ‐4‐vinylpyridine) block copolymer (PS‐ b ‐P4VP) thin film on a wafer substrate can be re‐assembled by sequential vapor treatment using selected solvents. Metal or other inorganic nanoparticles that were randomly pre‐loaded inside or on the surface of PS‐ b ‐P4VP thin film could be pulled to the rim of PS and P4VP along with the movements of PS and P4VP blocks during the treatment. As a result, the patterned polymeric or inorganic/polymer composite nanoisland and nanoring arrays were fabricated.

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