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Selective and Sequential Re‐Assembly of Patterned Block Copolymer Thin Film for Fabricating Polymeric, Inorganic, and Their Composite Nanostructured Arrays
Author(s) -
Zu Xihong,
Gong Jian,
Tu Weiping,
Deng Yulin
Publication year - 2011
Publication title -
macromolecular rapid communications
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.348
H-Index - 154
eISSN - 1521-3927
pISSN - 1022-1336
DOI - 10.1002/marc.201100313
Subject(s) - copolymer , materials science , nanoring , composite number , thin film , nanostructure , wafer , polymer , substrate (aquarium) , nanoparticle , styrene , chemical engineering , nanotechnology , polymer chemistry , composite material , oceanography , geology , engineering
We report that the nanostructures of poly(styrene‐ block ‐4‐vinylpyridine) block copolymer (PS‐ b ‐P4VP) thin film on a wafer substrate can be re‐assembled by sequential vapor treatment using selected solvents. Metal or other inorganic nanoparticles that were randomly pre‐loaded inside or on the surface of PS‐ b ‐P4VP thin film could be pulled to the rim of PS and P4VP along with the movements of PS and P4VP blocks during the treatment. As a result, the patterned polymeric or inorganic/polymer composite nanoisland and nanoring arrays were fabricated.