Ring Opening Metathesis Polymerization Derived Polymers as Photoresists: Making Use of Thiol‐ene Chemistry | Zendy

Wolfberger Archim | Zendy; Rupp Barbara | Zendy; Kern Wolfgang | Zendy; Griesser Thomas | Zendy; Slugovc Christian | Zendy

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Ring Opening Metathesis Polymerization Derived Polymers as Photoresists: Making Use of Thiol‐ene Chemistry

Author(s) -

Wolfberger Archim,

Rupp Barbara,

Kern Wolfgang,

Griesser Thomas,

Slugovc Christian

Publication year - 2011

Publication title -

macromolecular rapid communications

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 1.348

H-Index - 154

eISSN - 1521-3927

pISSN - 1022-1336

DOI - 10.1002/marc.201000698

Subject(s) - norbornene , photoresist , metathesis , ene reaction , polymerization , polymer , thiol , polymer chemistry , ring opening metathesis polymerisation , romp , chemistry , polymer science , materials science , organic chemistry , layer (electronics)

Ring opening metathesis polymerization derived poly(norbornene) films and aggregates were crosslinked via photo chemically induced thiol‐ene chemistry using a multifunctional thiol and the double bonds present in the polymer backbones. The presented method was illustrated by the description of a negative‐toned photoresist formulation based on above mentioned ingredients.

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