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Ring Opening Metathesis Polymerization Derived Polymers as Photoresists: Making Use of Thiol‐ene Chemistry
Author(s) -
Wolfberger Archim,
Rupp Barbara,
Kern Wolfgang,
Griesser Thomas,
Slugovc Christian
Publication year - 2011
Publication title -
macromolecular rapid communications
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.348
H-Index - 154
eISSN - 1521-3927
pISSN - 1022-1336
DOI - 10.1002/marc.201000698
Subject(s) - norbornene , photoresist , metathesis , ene reaction , polymerization , polymer , thiol , polymer chemistry , ring opening metathesis polymerisation , romp , chemistry , polymer science , materials science , organic chemistry , layer (electronics)
Ring opening metathesis polymerization derived poly(norbornene) films and aggregates were crosslinked via photo chemically induced thiol‐ene chemistry using a multifunctional thiol and the double bonds present in the polymer backbones. The presented method was illustrated by the description of a negative‐toned photoresist formulation based on above mentioned ingredients.