Premium
Patterning of Tailored Polycarbonate Based Non‐Chemically Amplified Resists Using Extreme Ultraviolet Lithography
Author(s) -
Yu Anguang,
Liu Heping,
Blinco James P.,
Jack Kevin S.,
Leeson Michael,
Younkin Todd R.,
Whittaker Andrew K.,
Blakey Idriss
Publication year - 2010
Publication title -
macromolecular rapid communications
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.348
H-Index - 154
eISSN - 1521-3927
pISSN - 1022-1336
DOI - 10.1002/marc.201000117
Subject(s) - resist , polycarbonate , polymer , lithography , materials science , photolithography , ultraviolet , extreme ultraviolet lithography , glass transition , x ray lithography , photoresist , nanotechnology , polymer chemistry , optoelectronics , composite material , layer (electronics)
A series of high‐performance polycarbonates have been prepared with glass‐transition temperatures and decomposition temperatures that are tunable by varying the repeat‐unit chemical structure. Patterning of the polymers with extreme UV lithography has been achieved by taking advantage of direct photoinduced chain scission of the polymer chains, which results in a molecular‐weight based solubility switch. After selective development of the irradiated regions of the polymers, feature sizes as small as 28.6 nm have been printed and the importance of resist‐developer interactions for maximizing image quality has been demonstrated.