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Formation of Two Kinds of Hexagonally Arranged Structures in ABC Triblock Copolymer Thin Films Induced by a Strongly Selective Solvent Vapor
Author(s) -
Luo Chunxia,
Huang Weihuan,
Han Yanchun
Publication year - 2009
Publication title -
macromolecular rapid communications
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.348
H-Index - 154
eISSN - 1521-3927
pISSN - 1022-1336
DOI - 10.1002/marc.200900427
Subject(s) - copolymer , materials science , polystyrene , annealing (glass) , solvent , thin film , polymer chemistry , cylinder , composite material , chemical engineering , nanotechnology , chemistry , organic chemistry , geometry , polymer , mathematics , engineering
An order–order transition (OOT) in the sequence of a hexagonally arranged core–shell cylinder to a double‐hexagonally arranged dot in polystyrene‐ block ‐poly(butadiene)‐ block ‐poly(2‐vinylpyridine) (SBV) triblock copolymer thin films is reported to be induced upon exposure to a solvent vapor that is strongly selective for the two end blocks. These two kinds of hexagonally arranged structures could form when the film thickness is 44, 123, and 223 nm. When the film thickness is decreased to 13 nm, the ordered structure is absent. The sizes of the core–shell cylinder structures formed with the same annealing time in films of different thickness are compared to address the effects of film thickness on the phase structure. The mechanism is analyzed from the total surface area of the blocks and the effective interaction parameter in the solvent vapor.